Aqua Regia, Hydrofluoric, wright etch, liquid crystal, Plasma clean

Aqua regia

- to remove wire bond
- after used cleaned with water

Hydrofluoric acid

- to ship down to silicon level
- put unit into the acid for about 5 minutes
- after used cleaned with water

Wright etch

- to etch the silicon level to magnify the defect
- put unit in the wright etch for 5 secs
- after used washed with water

Liquid crystal

- to determine the hotspot where the failing transistor early turn on
- put slightly on the die and observe with microscope (remember hair dryer)
- after used washed with acetone

****Plasma clean

- to neutral the charge up when SEM analysis BEFORE wright etch (charge up will affect the etching)
- put into the machine and follow the instruction shown
- after used can continue to wright etch or SEM analysis again.